(Patent Pending)
Designed for harsh and high-temperature vacuum applications including ALD, CVD and Etch systems.
Applications:
• Atomic Layer Deposition (ALD)
• Chemical Vapor Deposition (CVD)
• Plasma and Etch systems
• Semiconductor process equipment
• Research vacuum systems
Key Features:
• All-metal construction. Suitable for high-temperature and corrosive process environments.
• Fast actuation. Optimized for rapid open/close operation and stable process control.
• Clean vacuum operation. Designed to minimize particle generation and contamination.
• Precise pressure control. Suitable for demanding vacuum and gas flow regulation applications.
• Flexible integration. Compatible with existing vacuum systems and isolation valve configurations.
Potential benefits:
• Robust high-temperature operation
• Reduced maintenance requirements
• Stable and reproducible vacuum control
• Compact integration into existing systems
For more information or technical discussion, feel free to contact me.
2024.03.30
Conformal ALD coating (e.g. Al2O3) directly inside any vacuum chambers at 120-150°C without full system disassembly.
Suitable for:
• Vacuum deposition systems
• Plasma chambers
• Optics coating tools
• Semiconductor and research vacuum equipment
Potential benefits:
• Reduced contamination
• Improved corrosion resistance
• Stabilized chamber surfaces
• Protection against aggressive plasma chemistry
• Extended lifetime of vacuum components
• Refurbishment of aging vacuum tools
Retrofit concept: attach module → preheat chamber → perform ALD coating → return to operation.
For more information about how this deposition module can enhance your system or to discuss detailed specifications, feel free to contact me.
2023.06.15