Atomic Layer Deposition (ALD) enables the deposition of thin, precise, and highly uniform functional coatings on a wide range of substrates.
Key features include:
• Precision control
Atomic-level control of film thickness and composition, ensuring uniform coatings even on complex surfaces.
• Material versatility
Deposition of various materials including oxides, nitrides, and selected metals.
• Conformal coatings
Uniform coating of complex 3D structures and high aspect ratio features.
• Barrier properties
Effective protection against oxidation, moisture, and chemical exposure.
• Surface functionalization
Modification of electrical, optical, catalytic, and corrosion-related surface properties.
• Industrial scalability
Suitable for both research applications and industrial-scale manufacturing.
Typical applications:
• Electronics
• Energy storage
• Catalysis
• MEMS and nanotechnology
• Protective and functional surfaces
Key Specification:
All-around functional #ALD coating with Cobalt Oxide on mesh-shaped Alumina catalyst. Aspect ratio 1:30.
2023.06.12
Key Specification:
All-around functional #ALD coating with dense alumina (Al2O3) on stainless steel nozzle. Orifice d = 20um. Aspect ratio 1:50.
2023.04.05
Key Specification:
One run both sides #ALD coating on domed sapphire watch crystals d = 30.3mm with broadband AR blue and lotus (hydrophobic, WCA = 120°) effect.
#Optical materials: TiO2 / Al2O3
2022.11.29