Functional Coatings

Atomic Layer Deposition (ALD) is a cutting-edge technique used to create thin, precise, and uniform functional coatings on various substrates.


Here are some key advances:

• Precision Control
ALD allows for atomic-level control over film thickness and composition, ensuring uniform coatings even on complex surfaces.

• Versatility
It can be used to deposit a wide range of materials, including oxides, nitrides, and some metals, making it suitable for diverse applications.

• Conformal Coatings
ALD can coat high-aspect-ratio structures uniformly, critical for microelectronics and nanotechnology.

Barrier Properties
It provides excellent diffusion barriers for protecting materials from oxidation, moisture, and chemical exposure.

• Enhanced Performance
Functional coatings via ALD improve the performance of components in electronics, energy storage, and catalysis by enhancing conductivity, corrosion resistance, and catalytic activity.

• Scalability
Recent advancements have made ALD scalable for industrial applications, paving the way for its use in large-scale manufacturing.


These advances highlight ALD's potential in improving the durability, efficiency, and functionality of coated products across various industries.